ASML Ships Latest Lithography Equipment to Intel
Intense Competition for Equipment Securing... Chairman Lee Jae-yong Also Visits
ASML, a leading company in the semiconductor industry based in the Netherlands, has supplied its first high NA extreme ultraviolet (EUV) lithography equipment necessary for advanced semiconductor mass production to Intel. Major global semiconductor companies such as Samsung Electronics and Taiwan's TSMC are also moving quickly to procure ASML's equipment.
According to foreign media including Bloomberg on the 22nd (local time), "ASML has shipped the first high NA EUV lithography system, a key component of the latest semiconductor manufacturing equipment, and delivered it to Intel's D1X factory in Oregon, USA."
On the 21st, ASML expressed through its official social media (SNS), "We are pleased and proud to ship the first high NA EUV system to Intel."
The high NA EUV is ASML's latest product in the EUV lithography equipment sector, where it is the world's top manufacturer. The price is estimated to approach $300 million (approximately 390 billion KRW) per unit. Currently, the highest-end ASML equipment on the market costs about $180 million (approximately 234.3 billion KRW) per unit.
The high NA EUV is characterized by an increased lens numerical aperture (a measure of light-gathering ability) of 0.55 (compared to 0.33 in existing EUV equipment). With enhanced light concentration capability, it can draw circuits that are clearer and thinner than previous equipment. Major semiconductor companies worldwide plan to mass-produce chips with a line width of 2 nm or less starting in 2025, and such ultra-fine processes require EUV lithography equipment with short light wavelengths.
Pat Gelsinger, CEO of Intel, has expressed his intention to regain a leading position in semiconductor manufacturing by being the first to adopt this advanced equipment.
President Yoon Suk-yeol and King Willem-Alexander (third from the right) of the Netherlands are applauding at the signing ceremony for advanced semiconductor cooperation between the two countries held on the 12th at ASML headquarters located in Veldhoven. Samsung Electronics Chairman Lee Jae-yong, SK Group Chairman Chey Tae-won, and ASML CEO Peter Wennink were also present. [Image source=Yonhap News]
The annual production volume of high NA EUV is known to be around 10 units. Because of this, competition among Samsung Electronics, SK Hynix, TSMC, and others to secure the equipment is fierce.
The visits to ASML headquarters in mid-month by Samsung Electronics Chairman Lee Jae-yong, SK Group Chairman Chey Tae-won, and President Yoon Suk-yeol were also aimed at inspecting the equipment and strengthening cooperative relationships. Samsung Electronics plans to maximize the utilization of high NA EUV through joint R&D projects with ASML.
A Samsung Electronics official stated, "Samsung has secured technical priority for high NA EUV and has created an opportunity to use high NA EUV effectively in the long term."
© The Asia Business Daily(www.asiae.co.kr). All rights reserved.
