Juseong Engineering Ships DTC Silicon Capacitor ALD Equipment... "World's First Technology, Market Leadership"

Shipment to Silicon Capacitor Fabless 'ElsPass'

Jusung Engineering is shipping DTC silicon capacitor atomic layer deposition (ALD) equipment to take the lead in the next-generation semiconductor market. The company explained that it developed the equipment based on world-first technology. With the surge in demand for artificial intelligence (AI) semiconductors, it has created ALD equipment that reduces serious risks such as heat generation, leakage current, and noise, while stably supplying voltage and current, seizing the opportunity to increase global order performance.

Hwang Cheol-ju, Chairman of Jusung Engineering (center in the top row), and employees are taking a commemorative photo on the 17th at the research and development (R&D) center in Yongin-si, Gyeonggi-do, after developing DTC silicon capacitor atomic layer deposition (ALD) equipment.
[Photo by Jusung Engineering]

Jusung Engineering announced on the 17th that it shipped the equipment to ElsPace (formerly Allohim), a fabless (design-specialized) silicon capacitor company.

To realize high-performance semiconductors, the process must be miniaturized to fit tens of billions of transistors within a limited area. As demand for AI semiconductors increases and semiconductor integration density rises, problems such as heat generation, leakage current, and noise become more severe.

Jusung Engineering stated that silicon capacitors are emerging as an alternative. DTC silicon capacitors can stably supply voltage and current without noise even in high-temperature and high-frequency environments compared to existing MLCCs.

Unlike conventional multilayer ceramic capacitors (MLCCs), silicon capacitors are made of high-k dielectric compounds, resulting in higher efficiency. As bandwidth increases, more MLCCs are required. Silicon capacitors can replace them with just one unit. Therefore, they can be applied to ultra-compact form factor products.

To enhance the performance of silicon capacitors, it is important to deposit high-dielectric constant layers thinly and repeatedly on high aspect ratio structures. The high-k compounds can be deposited more precisely and quickly by utilizing the ALD equipment process developed by Jusung Engineering.

Jusung Engineering announced that it applied the world’s first ALD technology to the new application of DTC silicon capacitors. Starting from this point, the company plans to secure global customers by taking the lead in the early next-generation DTC market.

A Jusung Engineering official said, "Shipping the DTC silicon capacitor ALD equipment is the result of Jusung’s accumulated innovation and customer trust," adding, "We will lay the foundation for sustainable growth by leading the early next-generation semiconductor market."