Jostem announced on the 13th that it will supply the N2 Purge System, a humidity control solution, to the display market.
Jostem is diversifying its market by expanding its proprietary humidity control solution, the N2 Purge System, which was applied in semiconductor wafer production processes, into the display sector.
The N2 Purge System, which controls humidity to improve yield, is a solution independently developed by Jostem and has built a high market share by supplying it to semiconductor companies.
The N2 Purge System that Jostem is supplying to display companies this time is a solution that improves yield by applying technology verified in existing semiconductor mass production lines to display products. This product is installed in a batch format like the BIP product previously provided for semiconductor processes, controlling the humidity of 30 FOUPs simultaneously.
Jostem expects to supply additional products in the display field in the future. Kim Yong-jin, CTO of Jostem Research Institute, said, “Improving yield is essential in the display industry as well, and the demand for solutions to achieve this is increasing. We are confident that our solution will be recognized for its excellence in the display sector as well.”
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