Korea-New York Sign MOU for Public Semiconductor Fab Technology Cooperation

On the 9th, the Ministry of Science and ICT announced that it signed a Memorandum of Understanding (MOU) for technological cooperation between the Korea Nano Technology Institute and NY Creates at the EL Tower in Seoul to actively promote the 'Semiconductor Global Advanced Fab Linkage Utilization' project.

This MOU signing was made to concretize global R&D cooperation linking Korea and the United States' representative advanced public fabs, the Korea Nano Technology Institute and NY Creates, following discussions on the need to enhance technology exchange and cooperation in the semiconductor field at last year's Korea-US summit and the 11th Korea-US Science and Technology Joint Committee.

NY Creates is operated in Albany, the capital of New York State, after New York absorbed SEMATECH, a nonprofit R&D consortium that led semiconductor technology development in the United States.

The Korea Nano Technology Institute and NY Creates also held a Korea-US semiconductor testbed promotional conference to promote the linkage and utilization of advanced facilities between the two institutions, attended by about 200 domestic researchers and companies related to materials, parts, and equipment, and conducted business meetings to establish cooperative partnerships between NY Creates and domestic companies and research institutions.

Hwang Pan-sik, Director of the Research and Development Policy Office at the Ministry of Science and ICT, stated, “It is highly significant that the Semiconductor Korea-US Advanced Fab Linkage Utilization project has established a practical cooperation foundation between researchers and companies of both countries.” He added, “This will strengthen the Korea-US global semiconductor technology alliance, enhance the global technological competitiveness of domestic researchers and companies, and activate their entry into overseas markets.”